X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1991-01-04
1992-09-22
Porta, David P.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 87, 378148, 378149, G01N 2320
Patent
active
051503956
ABSTRACT:
A device for examining a test object (4) by means of gamma or X-rays, comprising a primary X-ray source for generating at least one primary X-ray pencil beam (3) which is directed onto the test object (4), and at least one slit diaphragm (8, 9) which is arranged between the test object (4) and a detector (6, 7) and which directs scattered X-rays (26, 27, 28, 29) produced by the primary X-ray beam (3) in the test object (4) onto at least one detector (6, 7). The depth range of the test object that can be covered by the detectors can be changed without changing the position of the test object or the examination device, in that the position of the slit diaphragm (8, 9) relative to the detector (6, 7) can be changed by means of an adjusting device (18, 19).
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patent: 4118632 (1978-10-01), Luig
patent: 4423422 (1983-12-01), Harding
patent: 4480332 (1984-10-01), Strecker
patent: 4750196 (1988-06-01), Harding
patent: 4809312 (1989-02-01), Annis
patent: 4899283 (1990-02-01), Annis
patent: 4918712 (1990-04-01), Le Floc'h et al.
Fischer Karl H.
Kosanetzky Josef
Porta David P.
Squire William
U.S. Philips Corporation
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