Device for etching semiconductors with a large surface area

Details Device for etching semiconductors with a large surface area Device for etching semiconductors with a large surface area

2007-04-24

2007-04-24

Wilkins, III, Harry D. (Department: 1742)

Chemistry: electrical and wave energy

Apparatus

Electrolytic

C204S273000, C204S275100, C205S668000, C205S672000

Reexamination Certificate

active

10520761

ABSTRACT:
The device etches semiconductors with a large surface area in a trough-shaped receptacle containing a liquid electrolyte. A sample head is mounted inside the etching trough, and is provided with a device for holding at least one semiconductor wafer. The device is tilted to promote turbulent electrolyte flow in a space between a bottom surface of the semiconductor wafer and top surface of the trough-shaped receptacle.

REFERENCES:
patent: 3536600 (1970-10-01), Van Dijk et al.
patent: 3643671 (1972-02-01), Henninges et al.
patent: 5374325 (1994-12-01), Cannizzaro, Jr.
patent: 6235147 (2001-05-01), Lee et al.
patent: 0853332 (1998-07-01), None
patent: 61255028 (1986-11-01), None

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