Device for developing treatment of semiconductor materials

Details Device for developing treatment of semiconductor materials Device for developing treatment of semiconductor materials

1987-05-19

1988-12-20

McIntosh, John

Coating apparatus

With vacuum or fluid pressure chamber

118 52, 118416, 118421, 118429, B05C 309, B05C 318

Patent

active

047918802

ABSTRACT:
A device for developing treatment of a semiconductor material which is provided with a cup-shaped basin having a liquid inlet passage in its center portion and an annular flat upper portion and a chuck positioned above the basin and having a lower end surface for supporting the semiconductor material to be developed, the basin being provided on its upper portion with a ring for temporarily storing the developing liquid supplied to the upper portion of the basin, the ring having a diameter larger than the size of the semiconductor material and the passage being provided with an automatically operable valve.

REFERENCES:
patent: 4590094 (1986-05-01), Ringer, Jr.
patent: 4640846 (1987-02-01), Kuo
patent: 4655162 (1987-04-01), Kameyama

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