Radiant energy – Luminophor irradiation
Patent
1994-06-28
1995-09-26
Valentine, Donald R.
Radiant energy
Luminophor irradiation
2504611, 2504831, 2041293, F21V 3300, G01J 158
Patent
active
054536243
ABSTRACT:
An n-type silicon (Si) wafer is galvanostatically etched in a hydrofluoric acid (HF)-containing solution while being illuminated with a 300 watt tungsten light source to form porous silicon with luminescent properties. Photoluminescence of the porous silicon is monitored using a short wavelength visible or ultraviolet light source and a monochromator/CCD detector assembly. Upon exposure to organic solvents, the photoluminescence is quenched. Within seconds of removal of the solvent, the original intensity is recovered and further exposure of the porous silicon to organic solvents will again result in quenching of the luminescence.
REFERENCES:
patent: 4409075 (1983-10-01), Kolbesen
patent: 4415414 (1983-11-01), Burton et al.
patent: 4800282 (1989-01-01), Nishimura
patent: 4874484 (1989-10-01), Foell et al.
patent: 5030009 (1991-07-01), Ando et al.
Doan Vincent V.
Sailor Michael J.
The Regents of the University of California
Valentine Donald R.
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