Device for deposition of semi-conductor material

Details Device for deposition of semi-conductor material Device for deposition of semi-conductor material

1976-06-10

1978-07-25

Stein, Mervin

Coating apparatus

With vacuum or fluid pressure chamber

118 495, 219499, 219501, C23C 1304, H05B 102

Patent

active

041022980

ABSTRACT:
A device for supplying heating current to a semiconductor carrier in connection with the thermal separation from a reactance gas, and deposition of semiconductor material upon such a carrier, with the device being operative to supply various voltage-current combinations required to maintain constant temperature of the carrier during the deposition operation, with the current supplied to the carrier being initiated during zero passages of the A.C. supply, and with control of the number of oscillations, per unit of time, of the heating current supplied.

REFERENCES:
patent: 2981605 (1961-04-01), Rummel
patent: 3336517 (1967-08-01), Cain
patent: 3459152 (1969-08-01), Garrison et al.
patent: 3548155 (1970-12-01), Rabindran
patent: 3821515 (1974-06-01), Stut
patent: 3980042 (1976-09-01), Stut

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