Device for depositing a layer of polycrystalline silicon on a ca

Details Device for depositing a layer of polycrystalline silicon on a ca Device for depositing a layer of polycrystalline silicon on a ca

1984-08-24

1985-06-04

McIntosh, John P.

Coating apparatus

Immersion or work-confined pool type

Work extending through pool-confining wall area

118401, 118419, B05C 3172

Patent

active

045207526

ABSTRACT:
A device for depositing a layer of polycrystalline silicon on a carbon tape comprises a bath of molten silicon through which the carbon tape is drawn vertically. Two semicircular channels are supported vertically in the vicinity of the edges of the tape with their concave side towards the tape. The channels are partially immersed in the bath so as to raise the level of its surface by capillary action. The device is applicable to the manufacture of solar cells.

REFERENCES:
patent: 1503128 (1924-07-01), Leland et al.
patent: 2577904 (1951-12-01), McNabb et al.
patent: 3429734 (1969-02-01), Coad
patent: 4299648 (1981-11-01), Ciszek et al.

Affiliated with

Also associated with

Rating

Device for depositing a layer of polycrystalline silicon on a ca does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Device for depositing a layer of polycrystalline silicon on a ca, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Device for depositing a layer of polycrystalline silicon on a ca will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-823357