Device for coating a substrate surface

Details Device for coating a substrate surface Device for coating a substrate surface

1997-02-28

1998-08-18

Bueker, Richard

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of coating supply or source outside of primary...

427596, 4272481, 118726, C23C 1400

Patent

active

057956286

ABSTRACT:
Device containing a vacuum chamber 30 and situated therein a substrate 10 and a vaporization crucible 22 filled with inorganic materials 24. Situated in the region of the vacuum chamber 30 is an electron beam or laser gun 26, the electron or laser beam 27 of which is directed at the crucible 22. The device is employed for coating a substrate surface 18 e.g. a plastic film with a thin coating of inorganic materials, such as e.g. silicon oxides, by vapor deposition of the inorganic materials 24.
The electron or laser beam 27 of the electron beam or laser gun 26 is directed at the surface of the inorganic materials 24 in the vaporizing crucible 22. The electron or laser beam 27 forms an angle .alpha. of 10.degree. to 80.degree. to the surface of the inorganic materials 24. On vaporizing the inorganic materials 24 an overhang 25 is formed in the inorganic materials 24 and, geometrically, there is no line of sight between the vaporizing inorganic materials and the substrate surface 18.
The process performed in the device leads to substrates e.g. plastic films the surfaces of which exhibit no inhomogenieties such as sprayed material, particles or droplets of inorganic materials.

REFERENCES:
patent: 3552352 (1971-01-01), McConnell
Patent Abstracts of Japan, vol. 95, No. 006, Jul. 31, 1995 & Japanese Publication No. 7074101, published Mar. 17, 1995.
Patent Abstracts of Japan, vol. 95, No. 005, Jun. 30, 1995 & Japanese Publication No. 7034231, published Feb. 3, 1995.

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