Device for cathode sputtering of at least two different material

Details Device for cathode sputtering of at least two different material Device for cathode sputtering of at least two different material

1982-12-09

1984-02-07

Demers, Arthur P.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204192R, C23C 1500

Patent

active

044301901

ABSTRACT:
Device for cathode sputtering of at least two different materials, including a holder, a device for cooling the holder, a heat-conducting layer disposed on the holder, a target being connected to the holder with the heat-conducting layer disposed therebetween, the target being formed of one of the materials to be sputtered and the target having a plurality of blind holes formed therein, and pins formed of another material to be admixed in the sputtering being fitted in at least one of the blind holes.

REFERENCES:
patent: 4013533 (1977-03-01), Cohen-Solal et al.
patent: 4132614 (1979-01-01), Cuomo et al.
patent: 4275126 (1981-06-01), Bergmann et al.
patent: 4350578 (1982-09-01), Friser et al.
patent: 4352974 (1982-10-01), Mizutani et al.
Gambino et al., IBM Technical Disclosure Bulletin, vol. 22, No. 3, Aug. 1979, pp. 1228-1229.

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