Device for cathode sputtering

Details Device for cathode sputtering Device for cathode sputtering

1997-04-11

1999-01-26

Nguyen, Nam

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429809, 20429811, 20429812, 20429814, 20429817, 20429818, C23C 1434

Patent

active

058633995

ABSTRACT:
A device for cathode sputtering for producing coatings on a substrate 27 by means of a sputtering cathode, which device can be introduced into a vacuum chamber and has magnets or ring magnets 9, 13 concentrically arranged in respect to the center axis 44 of the sputtering cathode, pole shoes 14 and a target 8. The target has a front surface 41 with at least a surface portion which is inclined with respect to the back surface 40 of the target. In the area of the back surface 40 of the target at least one second, outer ring magnet 42 with a larger diameter is provided in addition to the inner ring magnets 9, 13.

REFERENCES:
patent: 4060470 (1977-11-01), Clarke
patent: 4100055 (1978-07-01), Rainey
patent: 4407708 (1983-10-01), Landau
patent: 4957605 (1990-09-01), Hurwitt et al.
patent: 5688381 (1997-11-01), Gruenenfelder et al.

Affiliated with

Also associated with

Rating

Device for cathode sputtering does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Device for cathode sputtering, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Device for cathode sputtering will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1447021