Device for analysing a wavefront with enhanced resolution

Details Device for analysing a wavefront with enhanced resolution Device for analysing a wavefront with enhanced resolution

2007-11-27

2007-11-27

Toatley, Jr., Gregory J. (Department: 2877)

Optics: measuring and testing

Lamp beam direction or pattern

Reexamination Certificate

active

10483661

ABSTRACT:
A wavefront analysing device, of the Hartmann or Shack-Hartmann type, comprises in particular a set of sampling elements arranged in an analysis plane, and forming as many micro-lenses for sampling the incident wavefront, and a diffraction plane wherein are analysed the Airy discs of the different micro-lenses illuminated by the incident wavefront. The shape of each micro-lens is such that the associated diffraction figure has in the diffraction plane one or several preferential axe(s), and the microlenses are oriented in the analysis plane such that the preferential axe(s) of the diffraction figure of a micro-lens are offset relative to the preferential axes of the diffraction figures of neighbouring micro-lenses, thereby enabling to limit the overlapping of the diffraction figures.

REFERENCES:
patent: 4725138 (1988-02-01), Wirth et al.
patent: 5864381 (1999-01-01), Neal et al.
patent: 5973844 (1999-10-01), Burger
patent: 6376819 (2002-04-01), Neal et al.
patent: 6577403 (2003-06-01), Primot et al.
patent: 2 133 094 (1999-08-01), None
patent: WO 01 04591 (2001-01-01), None

Affiliated with

Also associated with

Rating

Device for analysing a wavefront with enhanced resolution does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Device for analysing a wavefront with enhanced resolution, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Device for analysing a wavefront with enhanced resolution will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3817828