Device for aligning masks in photolithography

Details Device for aligning masks in photolithography Device for aligning masks in photolithography

2005-05-10

2005-05-10

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Detailed holder for original

C355S053000, C355S072000

Reexamination Certificate

active

06891602

ABSTRACT:
The present invention provides a device for aligning masks in photolithography, wherein in a first mask holder for a first mask at least one adapter for a second mask can be provided, so that masks being adapted to either the first mask holder or to the at least one adapter can be used in the device. The invention is advantageous in that it allows an easy, time and cost saving changeover from one mask size to at least one different mask size.

REFERENCES:
patent: 4443098 (1984-04-01), Walwyn et al.
patent: 4766492 (1988-08-01), Miyawaki
patent: 5797317 (1998-08-01), Lahat et al.
patent: 5909030 (1999-06-01), Yoshitake et al.
patent: 19810055 (1999-09-01), None
patent: 106325996 (1994-11-01), None
patent: 11097327 (1999-04-01), None
patent: 2001-257151 (2001-09-01), None

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