Device for accommodating catalyst especially in the production o

Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – Including heat exchanger for reaction chamber or reactants...

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422191, 422193, 422196, B01J 806

Patent

active

051105640

ABSTRACT:
A device for accommodating catalyst in particular a primary and a secondary catalyst in the production of synthesis gas in an auto-thermal reformer has the primary catalyst being accommodated in a plurality of catalyst tubes, providing an optimal, and above all, compact design, guaranteeing sustained optimum gas flow and expansion properties in the context of an overall exothermic reaction. This is achieved in that each individual primary catalyst tube (11) correlates with an individual secondary catalyst and that the primary catalyst tube (11) continues in the form of a narrow feed tube (11a) that extends through the respective secondary catalyst (13).

REFERENCES:
patent: Re24311 (1957-05-01), Mader
patent: 1920632 (1933-08-01), Daniels
patent: 2029604 (1936-02-01), Bayer et al.
patent: 2579843 (1951-12-01), Mader
patent: 3516800 (1970-06-01), Yamamoto et al.
patent: 4731098 (1988-03-01), Marsch
patent: 4741885 (1988-05-01), Herbort et al.
patent: 4810472 (1989-03-01), Andrew et al.
patent: 4830091 (1989-05-01), Dierke et al.

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