Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1980-09-24
1983-02-15
Weisstuch, Aaron
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
204192D, 357 30, 357 73, 428428, 428432, 501 54, 501 65, C23C 1500, H01L 3100
Patent
active
043743919
ABSTRACT:
A fabrication technique is described for making various devices in which a type of glass is used as a surface protection layer. The glass layers are put down by particle bombardment (generally sputtering) of a borosilicate glass target. Devices with such surface layers are also described. Such glass layers are highly advantageous as encapsulating material, diffusion barrier layers, etc., particularly for optical type devices and certain semiconductor devices. Particularly important is the preparation procedure for the glass target used in the bombardment process. The glass layers are moisture stable, act as excellent barriers against diffusion, and are usable up to quite high temperatures without cracking or peeling. The glass layers also provide long-term protection against atmosphere components including water vapor, oxygen, atmosphere pollution contaminants, etc.
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L. G. Van Uitert et al., "Borosilicate Glasses for Fiber Optical Waveguides", Mat. Res. Bull., vol. 8, pp. 469-476, (1973).
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G. Brackley et al., "Integral Covers for Silicon Solar Cells", Conf. Record, 9th IEEE Photovoltaic Specialists Conf., (1972), pp. 174-178.
R. L. Crabb et al., "Evaluation of European Integral Solar Cell Covers Deposited by R. F. Sputtering", Conf. Record, 12th IEEE Photovoltaic Specialists Conf., (1976), pp. 577-586.
Camlibel Irfan
Singh Shobha
Van Uitert LeGrand G.
Bell Telephone Laboratories Incorporated
Nilsen Walter G.
Weisstuch Aaron
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