Device determining a concentration of a gas mixture

Chemistry: analytical and immunological testing – Measurement includes temperature change of the material...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

73 2501, 422 83, 422 94, 422 95, 422 96, 422 97, 422 98, 436144, 436155, 376300, 376301, 376313, 4235801, 4235802, G01N 2522

Patent

active

060748826

ABSTRACT:
In order to determine a concentration of a gas mixture, especially a hydrogen concentration of a containment atmosphere of a nuclear power station, a temperature change resulting from a catalytic reaction is measured. The gas mixture is diluted with a motive gas of known composition. The dilution is carried out by a jet pump.

REFERENCES:
patent: 1957341 (1934-05-01), Holt
patent: 3399398 (1968-08-01), Beckek et al.
patent: 4072043 (1978-02-01), Naizer et al.
patent: 4170455 (1979-10-01), Henrie
patent: 4226675 (1980-10-01), Lewis et al.
patent: 4298574 (1981-11-01), Bohl
patent: 4361028 (1982-11-01), Kamiya et al.
patent: 4617794 (1986-10-01), Fujitani et al.
patent: 4705669 (1987-11-01), Tsuji et al.
patent: 4863677 (1989-09-01), Eckardt
patent: 4911890 (1990-03-01), Singh et al.
patent: 5017331 (1991-05-01), Eckardt
patent: 5041265 (1991-08-01), Koike et al.
patent: 5060473 (1991-10-01), Nakagawa
patent: 5133184 (1992-07-01), Geiger
patent: 5167908 (1992-12-01), Chakraborty
patent: 5167927 (1992-12-01), Karlson
patent: 5321730 (1994-06-01), Eckardt
patent: 5374400 (1994-12-01), Sprinkle et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Device determining a concentration of a gas mixture does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Device determining a concentration of a gas mixture, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Device determining a concentration of a gas mixture will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2067737

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.