Device and process for liquid treatment of wafer-shaped...

Cleaning and liquid contact with solids – Apparatus – With plural means for supplying or applying different fluids...

Reexamination Certificate

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Details

C134S140000, C134S149000, C134S153000, C134S157000, C134S902000, C118S052000

Reexamination Certificate

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11367330

ABSTRACT:
A device for liquid treatment of a defined area of a wafer-shaped article, especially of a wafer, near the edge, in which the liquid is applied to a first surface, flows essentially radially to the outside to the peripheral-side edge of the wafer-shaped article and around this edge onto the second surface, the liquid wetting a defined section near the edge on the second surface and thereupon being removed from the wafer-shaped article.

REFERENCES:
patent: 4903717 (1990-02-01), Sumnitsch
patent: 5608943 (1997-03-01), Konishi et al.
patent: 5706843 (1998-01-01), Matsuo
patent: 5769945 (1998-06-01), Davis et al.
patent: 5861061 (1999-01-01), Hayes et al.
patent: 5871584 (1999-02-01), Tateyama et al.
patent: 5896877 (1999-04-01), Pirker
patent: 5904164 (1999-05-01), Wagner et al.
patent: 5945351 (1999-08-01), Mathuni
patent: 6013136 (2000-01-01), Mathuni
patent: 6056825 (2000-05-01), Sumnitsch
patent: 6095582 (2000-08-01), Siniaguine et al.
patent: 6140253 (2000-10-01), Hayes et al.
patent: 6140254 (2000-10-01), Endisch et al.
patent: 6162739 (2000-12-01), Sumnitsch et al.
patent: 6168660 (2001-01-01), Hayes et al.
patent: 6221157 (2001-04-01), Davis et al.
patent: 6316367 (2001-11-01), Sumnitsch
patent: 6702900 (2004-03-01), Yeh et al.
patent: 7172674 (2007-02-01), Engesser
patent: 0 810 641 (1997-12-01), None
patent: 63-6843 (1988-01-01), None
patent: 9-181026 (1997-07-01), None

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