Device and method of performing a seasoning process for a...

Details Device and method of performing a seasoning process for a... Device and method of performing a seasoning process for a...

2007-11-20

2007-11-20

Lebentritt, Michael (Department: 2812)

Semiconductor device manufacturing: process

Forming bipolar transistor by formation or alteration of...

Forming lateral transistor structure

C257SE21544, C257S557000

Reexamination Certificate

active

11303891

ABSTRACT:
A method of performing a seasoning process for a semiconductor device processing apparatus is provided by the present invention. The method includes: forming a material layer on a test wafer; coating a photoresist on the material layer; patterning the photoresist so as to expose a central region of the wafer and cover an edge region thereof; and etching the material layer exposed by the photoresist pattern.

REFERENCES:
patent: 4586243 (1986-05-01), Weaver et al.
patent: 6890834 (2005-05-01), Komobuchi et al.
patent: 6965107 (2005-11-01), Komobuchi et al.
patent: 7026223 (2006-04-01), Goodrich et al.
patent: 2002/0173149 (2002-11-01), Yanagisawa et al.
patent: 2003/0183920 (2003-10-01), Goodrich et al.

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