Device and method of forming film

Details Device and method of forming film Device and method of forming film

2011-07-12

2011-07-12

Kackar, Ram N (Department: 1716)

Coating apparatus

Gas or vapor deposition

Having means to expose a portion of a substrate to coating...

C118S715000, C118S504000

Reexamination Certificate

active

07976633

ABSTRACT:
A film forming device includes a mask member that is made of silicon and has first openings of predetermined patterns; a magnetic member that is made of a magnetic material and has a second opening, and that is aligned with the mask member so that the first openings are arranged in the second opening in plan view of the second opening; and a substrate holding member that generates magnetic force between the magnetic member and itself in order to adhere the mask member and a substrate to each other. The mask member and the substrate are interposed between the magnetic member and the substrate holding member in this order from the magnetic member.

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Communication from Korea Patent Office regarding counterpart application.

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