Device and method in connection with the production of...

Plastic and nonmetallic article shaping or treating: processes – Outside of mold sintering or vitrifying of shaped inorganic... – Including specified molding pressure or controlling of...

Reexamination Certificate

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C264S570000, C425S419000

Reexamination Certificate

active

10149072

ABSTRACT:
Device in connection with the lithography of structures of nanometer size, which device comprises a first main part (1) with a first principally plane surface (2a) and a second main part (3) with a second principally plane surface (9a), said first surface and second surface being opposite to one another and being arranged in principle parallel in relation to one another, with an adjustable interval between them, and said first and second surface being arranged to form a support for a substrate (5) and a template (10) respectively, or vice-versa. According to the invention, said second main part (3) also comprises a cavity (6) for a medium, and means for adjusting a pressure of said medium, a wall of said cavity consisting of a flexible membrane (9), of which one side, which side faces away from the cavity (6), forms said second surface (9a). The invention also relates to a method that utilizes the device.

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patent: 5507996 (1996-04-01), Brouard
patent: 5670228 (1997-09-01), Kakamu et al.
patent: 5772905 (1998-06-01), Chou
patent: 5947027 (1999-09-01), Burgin et al.
patent: 5956216 (1999-09-01), Chou
patent: 6019587 (2000-02-01), Takahashi et al.
patent: 6030576 (2000-02-01), Cassani
patent: 6482742 (2002-11-01), Chou
patent: 2002/0132482 (2002-09-01), Chou
patent: 2003/0189273 (2003-10-01), Olsson
patent: 2004/0219249 (2004-11-01), Chung et al.
patent: 01-241046 (1989-09-01), None
patent: WO 02/07199 (2002-01-01), None

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