Optics: measuring and testing – By light interference – For dimensional measurement
Reexamination Certificate
2007-09-11
2007-09-11
Toatley, Jr., Gregory J. (Department: 2877)
Optics: measuring and testing
By light interference
For dimensional measurement
Reexamination Certificate
active
10983593
ABSTRACT:
A device and a method for wavefront measurement of an optical imaging system, and a microlithography projection exposure machine that is equipped with such a device. The device has a wavefront generating unit that includes an optical element (1) with an object-side periodic structure (2), and a light source unit (20,21) for illuminating the object-side periodic structure with the aid of a measuring radiation. The device also has a detector unit that is arranged on the image side of the imaging system to be measured and that includes an optical element (3) with an image-side periodic structure, and a detector element (52, 52a, 52b) for detecting an overlay pattern of the imaged object-side periodic structure and image-side periodic structure. The wavefront generating unit is designed to restrict the angular spectrum (6) of the measuring radiation emanating from a respective field point (7), the design being such that the measuring radiation emanating from the respective field point illuminates only in each case a specific subregion of a pupil plane of the optical imaging system.
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Lyons Michael A
Sughrue Mion Pllc
Toatley , Jr. Gregory J.
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