Optics: measuring and testing – By light interference – Having wavefront division
Reexamination Certificate
2011-08-23
2011-08-23
Connolly, Patrick J (Department: 2877)
Optics: measuring and testing
By light interference
Having wavefront division
C355S053000
Reexamination Certificate
active
08004690
ABSTRACT:
A device for the optical measurement of an optical system which, in a useful operating mode, receives useful radiation on a useful radiation entrance side and emits it on a useful radiation exit side. The device includes a measurement radiation source, by which at least one exit-side element, which emits measurement radiation to the optical system, can be positioned on the useful radiation exit side of the optical system, and a detector, by which at least one entrance-side element, which receives measurement radiation coming from the optical system, can be positioned on the useful radiation entrance side of the optical system. The measurement radiation source includes a source-side measurement structure mask for positioning on the useful radiation exit side and/or the detector includes a detector-side measurement structure mask for positioning on the useful radiation entrance side. Also provided are a measurement structure support that can be used for such a device, a microlithography projection exposure apparatus equipped with such a device, and an associated method. The device can be used, e.g., for the wavefront measurement of projection objectives of microlithography projection exposure apparatuses.
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Carl Zeiss SMT GmbH
Connolly Patrick J
Sughrue & Mion, PLLC
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