Optics: measuring and testing – By light interference – For dimensional measurement
Reexamination Certificate
2011-03-22
2011-03-22
Toatley, Gregory J (Department: 2877)
Optics: measuring and testing
By light interference
For dimensional measurement
Reexamination Certificate
active
07911624
ABSTRACT:
A device and method for the interferometric measurement of phase masks, particularly from lithography. Radiation passing through a coherence mask is brought to interference by a diffraction grating. A phase mask is arranged in or near the pupil plane of the first imaging optics which can be positioned exactly in the x-y direction by which interferograms are generated which are phase-shifted in the x-y direction by translational displacement of the coherence mask or of the diffraction grating. The interferograms are imaged onto the spatially resolving detector by second imaging optic and the phase and transmission functions of the phase mask are determined by an evaluation unit. The invention can, of course, generally be applied to planar phase objects, such as biological structures, for example, points of establishment with respect to an interference microscope.
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Haidner Helmut
Wegmann Ulrich
Carl Zeiss SMS GmbH
Patterson Thuente Christensen Pedersen , P.A.
Richey Scott M
Toatley Gregory J
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