Device and method for the examination of thin layers

Details Device and method for the examination of thin layers Device and method for the examination of thin layers

2005-04-12

2005-04-12

Toatley, Jr., Gregory J. (Department: 2877)

Optics: measuring and testing

Of light reflection

Reexamination Certificate

active

06879401

ABSTRACT:
Device for the measurement of thickness changes as well as changes of the physicochemical characteristics of thin layers. The system consists of a preferably monochromatic source of light, a scanning mirror, a preferably on one side metallized prism and a photodetector array. The thin layer is irradiated with light at different angles through the prism by means of the scanning mirror. The reflected image of the layer shows with certain incidence angles when choosing a suitable wavelength, polarization and if needed the metal and the film thickness, resonance-caused intensity fluctuations, by which the layer thickness and refractive index can be calculated.

REFERENCES:
patent: 6493097 (2002-12-01), Ivarsson

Affiliated with

Also associated with

Rating

Device and method for the examination of thin layers does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Device and method for the examination of thin layers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Device and method for the examination of thin layers will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3377689