Device and method for removing gaseous impurities from a sealed

Heat exchange – With protector or protective agent

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

165917, 55 16, 55158, 422149, 422236, 423580, F28F 1300

Patent

active

048921424

ABSTRACT:
A container is disposed within a vacuum insulation jacket which surrounds a vessel or pipe which contains or through which flows a hydrogen containing medium. The container holds oxygen under pressure or holds a material which liberates oxygen when exposed to heat and/or reacts with water to liberate oxygen. The container is sealed by means of a membrane of palladium or palladium alloy. A water absorbing material is disposed inside the container. The palladium membrane is thus exposed on its first side facing the interior of the container to a region of relatively high oxygen pressure produced by the oxygen inside the container and low hydrogen partial pressure inside the container, and is exposed on its other side to the vacuum (low oxygen pressure, and higher hydrogen partial pressure as a result of the outgassing or permeation of hydrogen from the medium in contact with the vacuum chamber walls). The palladium acts as a catalyst for the combination of hydrogen and oxygen to form water when hydrogen flows from the vacuum jacket into the container following the hydrogen pressure gradient. The water thus formed is absorbed inside the container using a suitable water absorber, such as a molecular sieve. The method of using the device includes placing it within a vacuum chamber or between two concentrically arranged pipes constituting a vacuum chamber so that the palladium or palladium alloy membrane is in thermal communication with a high temperature surface, such as the surface of the wall of the pipe containing steam or a heat transfer fluid.

REFERENCES:
patent: 3437428 (1969-04-01), Quesada et al.
patent: 3534530 (1970-10-01), Eguchi et al.
patent: 3929422 (1975-12-01), Kreidl et al.
patent: 4014657 (1977-03-01), Gryaznov et al.
patent: 4782890 (1988-11-01), Shimodaira et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Device and method for removing gaseous impurities from a sealed does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Device and method for removing gaseous impurities from a sealed , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Device and method for removing gaseous impurities from a sealed will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-140397

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.