Liquid purification or separation – Processes – Liquid/liquid solvent or colloidal extraction or diffusing...
Patent
1997-10-14
2000-06-20
Fortuna, Ana
Liquid purification or separation
Processes
Liquid/liquid solvent or colloidal extraction or diffusing...
210641, 210650, 2101952, 210636, 21033301, 210149, 210 90, 134 10, 451 88, B01D 6100
Patent
active
060774371
ABSTRACT:
A polishing agent recovery and reuse method and device for the same removes large impurities by a filtration device, concentrates by an ultrafiltration device, and continuously recovers polishing agent. Polishing agent used in polishing a semiconductor board or a coating formed on top of a semiconductor board is collected in a pre-processing container after use. Large impurities are removed by a dual fine filtration device. The resulting filtrate is concentrated by an ultrafiltration device. The concentrated solution may then be mixed with filtrate from the dual fine filtration device to further concentrate the polishing agent. The concentration of the polishing agent in the concentrated solution, the pH, and the temperature of the solution are continuously monitored and controlled. The filtrate of the ultrafiltration device is further treated to remove impurities, resulting in pure or ultrapure water. The recovered polishing agent may be reused in further polishing steps.
REFERENCES:
patent: 5066402 (1991-11-01), Amselme et al.
patent: 5352277 (1994-10-01), Sasaki
patent: 5647989 (1997-07-01), Hayashi et al.
patent: 5664990 (1997-09-01), Adams et al.
Furukawa Yukihiro
Hayashi Yoshihiro
Nakajima Tsutomu
Saito Yukishige
Sato Shin
Fortuna Ana
NEC Corporation
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