Device and method for pulling a single crystal

Single-crystal – oriented-crystal – and epitaxy growth processes; – Processes of growth from liquid or supercritical state – Having pulling during growth

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

117 34, 117217, C30B 1514, C30B 1522

Patent

active

061530085

ABSTRACT:
Device for pulling a silicon single crystal 1 includes an element 5 which annularly surrounds the single crystal growing at a crystallization boundary; and the element has a face 6 directed at the single crystal. The element surrounds the single crystal substantially level with the crystallization boundary 2 and has the property of reflecting heat radiation radiated by the single crystal and the similar melt or of generating and radiating heat radiation back to the lower part of the crystal close to the crystallization boundary. There is also a method for pulling a silicon single crystal, in which the single crystal is thermally affected using the element surrounding it.

REFERENCES:
patent: 5441014 (1995-08-01), Tomioka et al.
patent: 5487354 (1996-01-01), von Ammon et al.
patent: 5567399 (1996-10-01), Von Ammon et al.
von Ammon, Wilfried et al., "The dependence of bulk defects on the axial perature gradient of silicon crystals during Czochralski growth", vol. 151 No. 3/4 (Jun. 1995): 273-277.
Dornberger, Erich et al., "The dependence of ring-like distributed stacking faults on the axial temperature gradient of growing Czochralski crystals", vol. 143 No. 5 (May 1996): 1648-53.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Device and method for pulling a single crystal does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Device and method for pulling a single crystal, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Device and method for pulling a single crystal will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1720678

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.