Chemistry of inorganic compounds – Hydrogen or compound thereof – Elemental hydrogen
Reexamination Certificate
2007-01-11
2010-10-19
Langel, Wayne (Department: 1793)
Chemistry of inorganic compounds
Hydrogen or compound thereof
Elemental hydrogen
C165SDIG051, C422S177000, C422S198000, C422S240000, C422S241000, C423S652000
Reexamination Certificate
active
07815891
ABSTRACT:
A hydrogen manufacturing apparatus for manufacturing hydrogen by utilizing heat generated in a nuclear plant. The apparatus has a heat exchanger or steam reformer to be brought into contact with cooling water containing tritium produced from the nuclear plant and a tritium permeation suppressing ceramic coating at least either the outer surface or the inner surface of the heat exchanger or steam reformer for suppressing permeation of tritium. Instead of coating with a tritium permeation suppressing ceramic, a structure prepared by combining at least two types of materials having different crystal structures may be used.
REFERENCES:
patent: 4161510 (1979-07-01), Edridge
patent: 5112580 (1992-05-01), Ajioka et al.
patent: 5558783 (1996-09-01), McGuinness
patent: 5595719 (1997-01-01), Ul-Haque et al.
patent: 5932182 (1999-08-01), Blaney
patent: 7264782 (2007-09-01), Nougier et al.
patent: 7311979 (2007-12-01), Mancini et al.
patent: 7326469 (2008-02-01), Dye et al.
patent: 2001/0002248 (2001-05-01), Ukai et al.
patent: 05-213602 (1993-08-01), None
patent: 2005-170707 (2005-06-01), None
patent: 2005-289740 (2005-10-01), None
Fujiwara Seiji
Kano Fumihisa
Saito Norihisa
Tsuchiya Yumiko
Foley & Lardner LLP
Kabushiki Kaisha Toshiba
Langel Wayne
LandOfFree
Device and method for producing hydrogen does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Device and method for producing hydrogen, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Device and method for producing hydrogen will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4235868