Device and method for preventing settlement of particles on a ch

Details Device and method for preventing settlement of particles on a ch Device and method for preventing settlement of particles on a ch

1997-05-06

1999-10-19

Powell, William

Semiconductor device manufacturing: process

Chemical etching

Combined with the removal of material by nonchemical means

156345, 216 89, 438693, H01L 2100

Patent

active

059688416

ABSTRACT:
A device and method for preventing settlement of particles on a chemical-mechanical polishing pad is provided. Specifically, a device capable of preventing settlement of particles on the pad is located between the polishing pad and a platen of a chemical-mechanical polishing apparatus.

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Brochure on Vibration Reduction by Active Control eXperts, Inc., 1994.
Brochure on PZT QuickPack by Active Control eXperts, Inc., 1995.

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