Semiconductor device manufacturing: process – Including control responsive to sensed condition – Optical characteristic sensed
Reexamination Certificate
2007-06-12
2007-06-12
Lindsay, Jr., Walter (Department: 2812)
Semiconductor device manufacturing: process
Including control responsive to sensed condition
Optical characteristic sensed
Reexamination Certificate
active
11062470
ABSTRACT:
Process exhaust gas is sampled, and the components of the process exhaust gas are analyzed by a Fourier-transform infrared spectroscope (FT-IR) (26). The analysis result is compared with a reference analysis result obtained from an analysis of process exhaust gas generated in an operation performed under reference process conditions. If the amount of a gas component changes to an amount that is outside a predetermined range set around a reference value obtained from the reference analysis result, a signal indicating a process error is outputted. Instead of the output of the signal indicating a process error, the process conditions can be automatically adjusted.
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Komiyama Kiyoshi
Nishikawa Hiroshi
Shimoda Takahiro
Lindsay, Jr. Walter
Pillsbury Winthrop Shaw & Pittman LLP
Stevenson Andre′
Tokyo Electron Limited
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