Device and method for measuring reflective notch control in phot

Details Device and method for measuring reflective notch control in phot Device and method for measuring reflective notch control in phot

1988-05-20

1989-08-22

Hayes, Monroe H.

Photocopying

Projection printing and copying cameras

Step and repeat

355 77, 356237, 430 8, 430318, G03B 2742

Patent

active

048600628

ABSTRACT:
A simple, inexpensive device and method are disclosed for measuring the effectiveness of a photoresist composition in controlling reflective notching. The device utilized in practicing the method is a metalized silicon wafer having a U-shaped image thereon. This wafer may be coated with a photoresist, exposed through a grating pattern and developed, whereby the degree of notching of the photoresist lines may be readily observed.

REFERENCES:
patent: 4317876 (1982-03-01), Haering
patent: 4437760 (1984-03-01), Ausschnitt
patent: 4681430 (1987-07-01), Goel et al.
patent: 4780747 (1988-10-01), Suzuki et al.
patent: 4803524 (1989-02-01), Ohno et al.
"IEDM International Electron Device Meeting", Lin et al., San Francisco, Calif., Dec. 13-15, 1982, pp. 399-402.

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