Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Reexamination Certificate
2006-11-28
2006-11-28
Wells, Nikita (Department: 2881)
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
C250S307000, C250S306000, C073S105000, C264S485000
Reexamination Certificate
active
07141808
ABSTRACT:
The invention relates to a device and a method for maskless microlithography. Several microstructured cantilevers (2) are arranged in an array (26) and an actuator is integrated in each of the cantilevers (2) of the array (26). A power supply and control unit (24) is provided, said unit adjusting the distance of the cantilevers (6) relative to a surface (4) that is to be structured by means of an appropriate voltage. Every point of the needles (6) is connected to said power supply and control unit (24). In order to implement the inventive method, an array (26) with cantilevers, each of which carries a point of a needle (6), is brought into contact with a surface (4) to be structured in such a way that the points of the needles (6) are arranged close to the surface (4) to be structured.
REFERENCES:
patent: 5856672 (1999-01-01), Ried
patent: 6189374 (2001-02-01), Adderton et al.
Minne, S.C., et al., “Independent parallel lithography using the atomic force microscope”, J. Vac. Sci. Technol. B. 14(4), Jul./Aug. 1996, pp. 2456-2461.
Fortagne Olaf
Hudek Peter
Ivanov Tzwetan
Rangelow Ivo
Hashmi Zia R.
Houston Eliseeva LLP
Wells Nikita
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