Radiant energy – Irradiation of objects or material
Reexamination Certificate
2011-06-14
2011-06-14
Vanore, David A (Department: 2881)
Radiant energy
Irradiation of objects or material
C250S491100, C250S492300, C430S004000, C430S005000, C430S269000, C430S270100, C216S056000
Reexamination Certificate
active
07960708
ABSTRACT:
Various embodiments disclose devices and methods for fabricating microporous particulate filters with regularly space pores wherein sheet membrane substrates are exposed to energetic particle radiation through a mask and the damaged regions removed in a suitable developer. The required depth of field is achieved by using energetic particles to minimize diffraction and an energetic particle source with suitably small diameter.
REFERENCES:
patent: 3303085 (1967-02-01), Price et al.
patent: 3770532 (1973-11-01), Bean et al.
patent: 3802972 (1974-04-01), Fleischer et al.
patent: 4832997 (1989-05-01), Balanzat et al.
patent: 5543046 (1996-08-01), Van Rijn
patent: 5753014 (1998-05-01), Van Rijn
patent: 5786396 (1998-07-01), Takita et al.
patent: 6762396 (2004-07-01), Abbott et al.
patent: 2003/0020024 (2003-01-01), Ferain et al.
patent: 2005/0128448 (2005-06-01), Box et al.
patent: 2005/0263452 (2005-12-01), Jacobson
patent: 2006/0124865 (2006-06-01), Wolfe et al.
patent: 2006/0280906 (2006-12-01), Trentacosta et al.
patent: 2007/0116610 (2007-05-01), Cuppoletti
R.G. Musket, “Extending ion-track lithography to the low-energy ion regime,” Journ. Appl. Phys. 99, 114314 (2006).
Emissivity of Materials, http://www.electro-optical.com/bb—rad/emissivity/matlemisivty.htm#Conductive Paints.
Nobuhiro Tokoro, et al., “Introduction of the Varian VIISta 3000 Single Wafer High-Energy Ion Implanter,” IEEE Conf. on Ion Implantation Technology, 368 (2000).
A. Roy, et al., “Image noise in helium lithography,” In press Journ. Vac. Sci. Technol.
J.R. Wasson, et al., “Ion Absorbing Stencil Mask Coatings for Ion Beam Lithography” Journ. Vac. Sci. Technol. B 15, 2214-2217 (1997).
T. Yamauci, et al., “Structural modification along heavy ion tracks in poly(allyl diglycol carbonate) films,” Japanese Journ. Appl. Phys. 47, 3606 (2008).
J. N. Randall and J. C. Wolfe, “Preparation of X-ray lithography masks using a tungsten reactive ion etching process,” Appl. Phys. Letts. 41, 247-248 (1982).
S.V. Pendharkar and J. C. Wolfe, “Tungsten trench etching in a magnetically enhanced triode reactor,” Journal of Vaccum Science and Technology 12, 601-604 (1994).
L. R. Harriott, “SCALPEL: projection electron beam lithography,” Proceedings of the Particle Accelerator Conference, 595, 1999.
Han, et al., “Fabrication and Characterization of Polymeric Microfiltration Membranes using Aperture Array Lithography,” Journal of Membrane Science, vol. 249 Issues 1-2, pp. 193-206 (2005).
PCT Search Report pertaining to Application No. PCT/US08/56848 dated Jul. 28, 2008.
Ruchhoeft Paul
Wolfe John C.
Ippolito Rausch Nicole
University of Houston
Vanore David A
Winstead PC
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