Device and method for heating substrate, and method for treating

Electric heating – Heating devices – Combined with container – enclosure – or support for material...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

118715, 118725, H05B 368, C23C 1600

Patent

active

060721626

ABSTRACT:
A device for heating a substrate comprises a heating plate for heating a to-be-treated substrate, substrate holding section for holding the to-be-treated substrate on the heating plate, a gas stream producing section for producing a gas stream in a space above the heating plate in one direction along a surface of the heating plate, and a heater provided at the heating plate, and having pattern symmetrical with respect to a gas stream flowing through the center of the heating plate, wherein the heater comprises a first heater constituting section having heater elements arranged in the form of a ring, and a second heater constituting section located inside the first heater constituting section and having heater elements which are arranged so that more heat is generated in an upstream side of the gas stream than in a downstream side thereof.

REFERENCES:
patent: 4332833 (1982-06-01), Aspnes et al.
patent: 5177878 (1993-01-01), Visser
patent: 5226056 (1993-07-01), Kilkuchi et al.
patent: 5290381 (1994-03-01), Nozawa et al.
patent: 5294778 (1994-03-01), Carman et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Device and method for heating substrate, and method for treating does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Device and method for heating substrate, and method for treating, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Device and method for heating substrate, and method for treating will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2215111

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.