Device and method for doubling the frequency of elecromagnetic r

Details Device and method for doubling the frequency of elecromagnetic r Device and method for doubling the frequency of elecromagnetic r

1989-03-16

1989-09-19

Sikes, William L.

Electrical transmission or interconnection systems

Nonlinear reactor systems

Multiaperture

350 9612, 372 22, G02B 100

Patent

active

048675105

ABSTRACT:
A device and method for doubling the frequency of electromagnetic radiation of a given frequency are described. The device comprises a substrate (1) on which is provided a first layer (2) and a second layer (3). One of the first and second layers (2) has a plasma oscillation frequency equal to the given frequency for causing an electric field at twice the given frequency to be produced across the device in response to electromagentic radiation at the given frequency being incident on the device normally of the first and second layers (2and 3). A thus-produced electric field is converted to electromagnetic radiation at twice the given frequency by the said other of the first and second layers (3) which forms a waveguide for electromagnetic radiation at twice the given frequency. A further layer (2') similar to the said one layer (2) may be provided so that the said other layer (3) is sandwiched between the said one and further layers (2 and 2').

REFERENCES:
patent: 3831038 (1974-08-01), Dabby et al.
patent: 3935472 (1976-01-01), Bethea et al.
patent: 4178604 (1979-12-01), Nakamura et al.
patent: 4427260 (1984-01-01), Puech et al.
"Surface Plasmas in Thin Films", Physical Review, vol. 182, No. 2, 1969.

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