Device and method for cutting an assembly

Semiconductor device manufacturing: process – Bonding of plural semiconductor substrates – Subsequent separation into plural bodies

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C156S345420

Reexamination Certificate

active

10886436

ABSTRACT:
A method is presented for cutting an assembly that includes two layers of material having a first surface and a second surface. The method includes providing a weakened interface between the two layers that defines an interface ring about the periphery of the assembly, providing a high-pressure zone at the interface ring, and providing at least one controllable low-pressure zone in the vicinity of at least one of the first surface and the second surface. The technique also includes supplying the high-pressure zone with a controllable high-pressure force, and attacking the interface ring with at least one mechanical force in combination with the high-pressure force to cut the assembly.

REFERENCES:
patent: 6221740 (2001-04-01), Bryan et al.
patent: 6284631 (2001-09-01), Henley et al.
patent: 6468879 (2002-10-01), Lamure et al.
patent: 6821376 (2004-11-01), Rayssac et al.
patent: 1 107 295 (2001-06-01), None
patent: 2 785 217 (2000-05-01), None
patent: 2 796 491 (2001-01-01), None
patent: WO 01/04933 (2001-01-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Device and method for cutting an assembly does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Device and method for cutting an assembly, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Device and method for cutting an assembly will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3873896

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.