Cleaning and liquid contact with solids – Processes – Combined
Reexamination Certificate
2005-01-04
2005-01-04
Markoff, Alexander (Department: 1746)
Cleaning and liquid contact with solids
Processes
Combined
C134S0570DL, C438S692000, C422S068100, C451S008000
Reexamination Certificate
active
06837942
ABSTRACT:
A chemical collection assembly and a method for using the assembly such that a chemical-mechanical polishing (CMP) pad used in the manufacture of semiconductor wafers can be assessed for cleanliness. The method involves delivering solvent from the assembly's reservoir to an enclosed volume over the CMP pad. The solvent then brings contaminants imbedded on the CMP pad into solution. This solution is then drawn back up from the enclosed volume wherefrom a sample of the solution can be taken. That sample is then analyzed for the level of contaminants present therein, and the analysis is compared to a pre-determined level of cleanliness to determine whether the CMP pad should or should not continue to be used for semiconductor wafer manufacturing.
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Knobbe Martens Olson & Bear LLP
Markoff Alexander
Micro)n Technology, Inc.
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