Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Reexamination Certificate
2006-05-23
2006-05-23
Kornakov, M. (Department: 1746)
Cleaning and liquid contact with solids
Processes
Including application of electrical radiant or wave energy...
C015S001510, C015S405000, C015S409000, C015S415100, C015S345000, C034S060000, C034S061000, C034S085000, C134S001000, C134S034000, C134S036000, C134S094100, C134S102100, C134S103200, C134S133000, C134S137000, C134S151000, C134S198000, C134S199000, C134S037000
Reexamination Certificate
active
07047984
ABSTRACT:
A cleaning device for use in the production of semiconductor components comprises two feed devices with which a fluid medium is guided across a respective surface of an object to be cleaned so that different faces of the object are simultaneously cleaned. At least two gas feeding devices, having one means each for directing a gas flow onto the surface of the object to be cleaned, open into a cleaning chamber supplying a pressurized cleaning gas. At least two extraction means are connected to the outside of the cleaning chamber for discharging the gas fed to the cleaning chamber. The object can be introduced into the cleaning chamber through at least one gap. At least two ionization means are used to ionize the gas and the particles that are present in the cleaning chamber. One ionization means each is mounted between a direction means and an extraction means.
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Blattner Jakob
Federici Rudy
Brooks Automation Inc.
Kornakov M.
Perman & Green LLP
Pickreign Richard
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