Development-processing method for silver halide photographic lig

Radiation imagery chemistry: process – composition – or product th – Color imaging process – Using identified radiation sensitive composition in the...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430376, 430436, 430438, 430439, 430614, 430423, 430445, 430446, 430600, 430603, 430611, G03C 530

Patent

active

046346600

ABSTRACT:
In the presence of a novel antifoggant represented by the general formula (I), a silver halide photographic material which has at least one light-sensitive silver halide emulsion layer on a support is development-processed. The developing solution is one containing both dihydroxybenzenes and 3-pyrazolidones, a developing solution containing both dihydroxybenzenes and aminophenoles, or a developing solution containing a primary aromatic amine developer to suppress markedly fog generation at much reduced sacrifice of sensitivity: ##STR1## wherein M represents a hydrogen atom, an alkali metal atom, NH.sub.4 or a mercapto group-protecting moiety which can be split-off in the presence of an alkali; n represents 1, 2 or 3; R.sup.1 represents a hydrogen atom or --COOR.sup.2 ; and R.sup.2 represents a hydrogen atom, an alkali metal atom, NH.sub.4, or an unsubstituted or substituted alkyl, aryl or aralkyl group.

REFERENCES:
patent: 3295976 (1967-01-01), Abbott et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Development-processing method for silver halide photographic lig does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Development-processing method for silver halide photographic lig, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Development-processing method for silver halide photographic lig will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-683920

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.