Development processing method

Radiation imagery chemistry: process – composition – or product th – Post imaging processing – Developing

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430445, 430446, 430488, G03C 529

Patent

active

059725800

ABSTRACT:
A development processing method comprises: exposing a silver halide light-sensitive material comprising a support having thereon at least one light-sensitive silver halide emulsion layer; and developing said exposed light-sensitive material with a developing solution, wherein at least one of said silver halide emulsion layer and other hydrophilic colloidal layers contains at least one hydrazine derivative, and wherein said developing solution is substantially free from a dihydroxybenzene compound, has a pH of from 9.0 to 10.5, and contains (1) at least one ascorbic acid derivative developing agent, (2) at least one aminophenol auxiliary developing agent and (3) a specific mercaptopyrimidine compound. The processing method provides a high-contrast image required in the field of graphic arts using a developing solution having no problem with respect to the ecosystem and working environment, without causing silver stain even at a low replenishment rate.

REFERENCES:
patent: 5264323 (1993-11-01), Purol et al.
patent: 5503965 (1996-04-01), Okutsu
patent: 5506092 (1996-04-01), Ishikawa et al.
patent: 5508153 (1996-04-01), Ishikawa et al.
patent: 5618661 (1997-04-01), Sampei
patent: 5707790 (1998-01-01), Yanagisawa

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Development processing method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Development processing method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Development processing method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-762074

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.