Development device and development method

Details Development device and development method Development device and development method

2004-12-24

2010-11-02

Edwards, Laura (Department: 1713)

Coating apparatus

Control means responsive to a randomly occurring sensed...

C118S052000, C118S313000, C118S320000, C118S321000, C118S323000, C118S679000, C118S689000, C396S611000, C134S094100, C134S099100, C134S172000, C134S902000

Reexamination Certificate

active

07823534

ABSTRACT:
A developer nozzle is moved from a periphery of a wafer toward the central portion while an exposed substrate held at a spin chuck is being rotated about a vertical axis and while a developing solution is being discharged from the developer nozzle, and this way the developing solution is supplied to the surface of the wafer, the developer nozzle having a slit-like ejection port whose longitudinal direction is oriented to the direction perpendicular to the radial direction of the wafer. The movement speed of the nozzle is higher than a case where a nozzle with a small-diameter circular nozzle is used, and this enables a development time to be reduced. Further, the thickness of a developing solution on a substrate can be reduced, so that the developing solution can be saved.

REFERENCES:
patent: 3953265 (1976-04-01), Hood
patent: 5499733 (1996-03-01), Litvak
patent: 5962070 (1999-10-01), Mitsuhashi et al.
patent: 6191053 (2001-02-01), Chun et al.
patent: 6241403 (2001-06-01), Sakamoto et al.
patent: 6247479 (2001-06-01), Taniyama et al.
patent: 6371667 (2002-04-01), Kitano et al.
patent: 6416583 (2002-07-01), Kitano et al.
patent: 6656277 (2003-12-01), Sanada et al.
patent: 2001/0009452 (2001-07-01), Matsuyama et al.
patent: 2002/0000193 (2002-01-01), Kitano et al.
patent: 1 732 108 (2006-12-01), None
patent: 1 793 417 (2007-06-01), None
patent: 2 270318 (1990-11-01), None
patent: 3 124017 (1991-05-01), None
patent: 7 263302 (1995-10-01), None
patent: 8-8163 (1996-01-01), None
patent: 8-22128 (1996-01-01), None
patent: 11 111603 (1999-04-01), None
patent: 11 156278 (1999-06-01), None
patent: 11-264756 (1999-09-01), None
patent: 11-329955 (1999-11-01), None
patent: 2000 315643 (2000-11-01), None
patent: 2001 102292 (2001-04-01), None
patent: 2001 274082 (2001-10-01), None
patent: 2001 284206 (2001-10-01), None
patent: 2003 303752 (2003-10-01), None
patent: WO 98/57757 (1998-12-01), None
U.S. Appl. No. 12/173,285, filed Jul. 15, 2008, Yamamoto, et al.
U.S. Appl. No. 12/173,262, filed Jul. 15, 2008, Yamamoto, et al.

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