Development apparatus for manufacturing semiconductor device

Photography – Fluid-treating apparatus – Fluid application to one side only of photographic medium

Reexamination Certificate

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Details

C396S611000, C396S627000, C430S311000, C430S322000, C118S052000

Reexamination Certificate

active

07025514

ABSTRACT:
A development apparatus for discharging a developer onto a surface of a semiconductor substrate (15) comprises a nozzle pipe (13) for supplying the developer, and a nozzle (14) having a shape of a spoon with a taper and discharging the developer supplied by the nozzle pipe onto the surface of the substrate. The nozzle sprays the developer onto the surface of the substrate at any spray angle under a low and constant pressure.

REFERENCES:
patent: 6376013 (2002-04-01), Rangarajan
patent: 07-176471 (1995-07-01), None

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