Developing unit

Details Developing unit Developing unit

1998-02-18

1999-04-06

Rutledge, D.

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

118 52, 427240, G03D 500

Patent

active

058930043

ABSTRACT:
There is provided a solution heap control panel for ladling out a surplus developing solution that has been heaped up on a wafer to have a developing solution layer of a desired thickness and for passing and flowing downwards the ladled-out developing solution while rotating the wafer, so that a developing solution layer of a constant thickness is formed on the wafer. The ladled-out developing solution is dropped into a cup outside the wafer. Therefore, it is always possible to make constant the thickness of the developing solution layer without a traveling of the developing solution to the rear surface of the wafer in a developing unit.

REFERENCES:
patent: 4113492 (1978-09-01), Sato et al.

Affiliated with

Also associated with

Rating

Developing unit does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Developing unit, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Developing unit will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1380697