Developing solution supply nozzle with stirrer

Details Developing solution supply nozzle with stirrer Developing solution supply nozzle with stirrer

2008-05-06

2008-05-06

Cooley, Charles E. (Department: 1797)

Agitating

Having specified feed means

Predetermined mixing ratio

C366S172100, C118S323000

Reexamination Certificate

active

07367710

ABSTRACT:
According to the present invention, an anti-reflective film formed under a resist film is removed in a photolithography process of a wafer without affecting the resist film. According to the present invention, in a photolithography process of a substrate, an anti-reflective film having solubility in the developing solution is formed and thereafter a resist film is formed. In development treatment after exposure processing, a developing solution is supplied to the substrate to develop the resist film. At an instant when the development of the resist film is finished, a second developing solution lower in concentration than the developing solution is supplied to the substrate. Only the anti-reflective film is dissolved and removed by the supply of the second developing solution. The developing solution is supplied to the substrate by a supply nozzle having a stirrer.

REFERENCES:
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patent: 2005/0223980 (2005-10-01), Awamura et al.
patent: 2007/0184178 (2007-08-01), Yamamoto et al.
patent: 451921 (1991-10-01), None
patent: 08-97191 (1996-04-01), None

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