Developing method, substrate treating method, and substrate...

Details Developing method, substrate treating method, and substrate... Developing method, substrate treating method, and substrate...

2006-02-21

2006-02-21

Le, Hoa Van (Department: 1752)

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

C396S627000, C430S322000, C430S325000, C156S345180, C156S345210, C134S001300, C134S021000, C134S033000, C134S036000, C427S240000, C427S425000, C118S319000, C118S320000, C118S321000, C438S745000, C438S747000, C438S748000, C438S906000

Reexamination Certificate

active

07001086

ABSTRACT:
A developing method comprises determining in advance the relation of resist dissolution concentration in a developing solution and resist dissolution speed by the developing solution, estimating in advance the resist dissolution concentration where the resist dissolution speed is a desired speed or more from the relation, and developing in a state in which the resist dissolution concentration in the developing solution is the estimated dissolution concentration or less.

REFERENCES:
patent: 6550990 (2003-04-01), Sakurai et al.
patent: 2002/0121341 (2002-09-01), Tanaka et al.
patent: 2002-252167 (2002-09-01), None

Affiliated with

Also associated with

Rating

Developing method, substrate treating method, and substrate... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Developing method, substrate treating method, and substrate..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Developing method, substrate treating method, and substrate... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3703540