Developing method and developing apparatus

Details Developing method and developing apparatus Developing method and developing apparatus

2008-11-18

2011-11-08

Nguyen, Hung Henry (Department: 2882)

Photocopying

Projection printing and copying cameras

With developing

C355S037000

Reexamination Certificate

active

08054443

ABSTRACT:
A developing method is used for subjecting a light-exposed resist film disposed on a wafer W to a developing process by a developing solution and a rinsing process by a rinsing liquid. In a state where the resist film on the wafer W is wet with the developing solution or rinsing liquid before a drying process is performed on the wafer W, a chemical liquid (curing chemical liquid), which contains a resist curing aid contributory to curing of a resist film remaining on the wafer W, is supplied onto a surface of the wafer W. Then, ultraviolet rays are radiated onto a surface of the wafer to cure a resist film remaining on the wafer W by a synergistic effect of the resist curing aid and the ultraviolet rays thus radiated, so as to prevent pattern fall.

REFERENCES:
patent: 6634805 (2003-10-01), Templeton et al.
patent: 6819427 (2004-11-01), Subramanian et al.
patent: 7918182 (2011-04-01), Yamamoto et al.
patent: 2005/0223980 (2005-10-01), Awamura et al.
patent: 62-31122 (1987-02-01), None
patent: 63-229715 (1988-09-01), None
patent: 6-275514 (1994-09-01), None
patent: 06275514 (1994-09-01), None
patent: 6-283414 (1994-10-01), None
patent: 7-20637 (1995-01-01), None
patent: 7-239558 (1995-09-01), None
patent: 07239558 (1995-09-01), None
patent: 2000-89477 (2000-03-01), None
patent: WO 03105201 (2003-12-01), None

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