Developing method and apparatus for performing development...

Details Developing method and apparatus for performing development... Developing method and apparatus for performing development...

2006-07-18

2006-07-18

Rutledge, D. (Department: 2851)

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

C118S052000

Reexamination Certificate

active

07077585

ABSTRACT:
Since it is possible to exhaust air from a first peripheral region α around a substrate undergoing processing and further exhaust air from a second peripheral region β between the first peripheral region and the substrate, it is possible to reduce the effects of air flow on a developing solution on a substrate, and to enable the developing solution used in development processing to act effectively on the exposed resist on the substrate.

REFERENCES:
patent: 6419408 (2002-07-01), Inada
patent: 6715943 (2004-04-01), Nagamine
patent: 2003/0044731 (2003-03-01), Yoshihara et al.
patent: 11087225 (1999-03-01), None

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