Developing method and apparatus for performing development...

Details Developing method and apparatus for performing development... Developing method and apparatus for performing development...

2008-03-04

2008-03-04

Rutledge, D. (Department: 2851)

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

C355S027000

Reexamination Certificate

active

07338223

ABSTRACT:
A substrate processing apparatus and method provide for exhausting air from a first peripheral region α around a substrate undergoing processing, and for exhausting air from a second peripheral region β between the first peripheral region and the substrate. The method reduces the effects of air flow on a developing solution on the substrate, and enables the developing solution to act effectively on the exposed resist on the substrate.

REFERENCES:
patent: 6264381 (2001-07-01), Ueda
patent: 6715943 (2004-04-01), Nagamine
patent: 2002/0053319 (2002-05-01), Nagamine
patent: H01-241840 (1989-09-01), None
patent: H11-003852 (1999-01-01), None
patent: 2001-023892 (2001-01-01), None
patent: 2001-118790 (2001-04-01), None
patent: 2002-151376 (2002-05-01), None

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