Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
Reexamination Certificate
2006-09-05
2006-09-05
Le, Hoa Van (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Including control feature responsive to a test or measurement
C430S399000
Reexamination Certificate
active
07101646
ABSTRACT:
In this developing method and apparatus, a concentration measuring unit222picks part of developing fluid in a blending tank186to measure the resist concentration by an absorption photometry and feeds the detected resist concentration to a control unit240. The control unit240controls respective valves210, 212, 216of a TMAH concentrate solution200, a solvent pipe204and a drain pipe208in a manner that the developing fluid in the blending tank186has a TMAH concentration corresponding to a measured resist-concentration value to accomplish a constant developing rate, performing component control of the developing fluid. The developing fluid transferred from the blending tank186to a supply tank188is fed to a developer nozzle DN in a developing section126through a developer pipe224owing to the drive of a pump228. Accordingly, even if the developing fluid is reused in the developing process in multiple times, it is possible to make sure of the uniformity in development.
REFERENCES:
patent: 5223881 (1993-06-01), Nakagawa et al.
patent: 5945161 (1999-08-01), Hashimoto et al.
patent: 5965200 (1999-10-01), Tateyama et al.
patent: 6090205 (2000-07-01), Sakai et al.
patent: 6120945 (2000-09-01), Tanaka et al.
patent: 6569609 (2003-05-01), Timpe et al.
patent: 6588927 (2003-07-01), Nakagawa et al.
patent: 6752545 (2004-06-01), Nakagawa et al.
patent: 2002/0146251 (2002-10-01), Nakagawa et al.
patent: 2003/0096199 (2003-05-01), Nakagawa et al.
patent: 8-45832 (1996-02-01), None
patent: 9-7939 (1997-01-01), None
patent: 10-321517 (1998-12-01), None
Nomura Masafumi
Shinogi Taketora
Tateyama Kiyohisa
Le Hoa Van
Tokyo Electron Limited
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