Developing device and developing method

Details Developing device and developing method Developing device and developing method

2011-04-05

2011-04-05

Koch, III, George R (Department: 1745)

Coating apparatus

Control means responsive to a randomly occurring sensed...

Temperature responsive

C118S666000, C118S052000, C118S313000, C118S323000, C396S611000, C396S626000, C396S627000

Reexamination Certificate

active

07918182

ABSTRACT:
The temperature of a developing solution is varied depending on the type of resist or the resist pattern. The developing solution is applied while scanning a developer nozzle having a slit-shaped ejection port that has a length matching the width of the effective area of the substrate. After leaving the substrate with the developing solution being coated thereon for a predetermined period of time, a diluent is supplied while scanning a diluent nozzle, thereby substantially stopping the development reaction and causing the dissolved resist components to diffuse. A desired amount of resist can be quickly dissolved through the control of the developing solution temperature, while the development can be stopped before the dissolved resist components exhibit adverse effect through the supply of the diluent a predetermined timing, whereby achieving a pattern having a uniform line width and improved throughput.

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