Developing apparatus of photoresist

Details Developing apparatus of photoresist Developing apparatus of photoresist

1992-03-09

1993-06-08

Wintercorn, Richard A.

Photocopying

Projection printing and copying cameras

With developing

355 53, G03B 2732, G03B 2752, G03B 2742

Patent

active

052184005

ABSTRACT:
A developing apparatus of photoresist for controlling development of a photoresist formed on a light-transmitting substrate and having a latent image produced by exposure thereof to an irradiation for equi-pitch patterns, adapted to detect monitor light diffracted by the equi-pitch patterns produced as development of the resist advances after the diffracted light is totally reflected at the opposite surface to the surface through which it is let in and diffracted again by the equi-pitch patterns and the developing process is controlled according to a signal obtained as the result of the detection.

REFERENCES:
patent: 4647172 (1987-03-01), Batchelder et al.
patent: 4841342 (1989-06-01), Suzuki et al.
patent: 4899195 (1990-02-01), Gotoh
patent: 4910549 (1990-03-01), Sugita
patent: 4998021 (1991-03-01), Mimasaka
patent: 5028955 (1991-07-01), Hayashida et al.
patent: 5119127 (1992-06-01), Watanuki
Patent Abstracts of Japan, vol. 12, No. 395 (E-671) Oct. 20, 1988 of Japanese Application 63136625 of Jun. 8, 1988.
Patent Abstracts of Japan, vol. 10, No. 256, (P-493) Sep. 2, 1986 of Japanese Application 61083904 of Apr. 28, 1986.
Patent Abstracts of Japan, vol. 14, No. 372, (P-1091) Aug. 10, 1990 of Japanese Application 2137852 of May 28, 1990.
Mariste Thomson, "In Situ End Point Control of Photoresist Development", Solid State Technology, vol. 33, No. 5, May 1990, pp. 171-175.

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