Developing apparatus for exposed photoresist coated wafers

Details Developing apparatus for exposed photoresist coated wafers Developing apparatus for exposed photoresist coated wafers

1982-03-22

1984-02-07

Mathews, A. A.

Cleaning and liquid contact with solids

Apparatus

Sequential work treating receptacles or stations with means...

354324, 354330, 134102, 134148, 134161, G03D 304, G03D 306

Patent

active

044299834

ABSTRACT:
This developer station comprises a developing tank arranged with a centrally located rotatable and vertically translatable shaft carrying a workpiece platform at the upper end thereof. Initially, the platform is located above the tank for ease in loading a workpiece, for example an exposed photoresist coated semiconductor device component. The workpiece is then lowered into developing solution in the tank where it is rotated and oscillated vertically for agitational action during a predetermined time period after which it is raised up out of the solution and delayed at a drying station for another predetermined time period. Thereafter, the workpiece is returned to the initial position for unloading.

REFERENCES:
patent: 3769992 (1973-11-01), Wallestad
patent: 3849906 (1974-11-01), Hansen et al.
patent: 3990462 (1976-11-01), Elftmann
patent: 4132567 (1979-01-01), Blackwood
patent: 4161356 (1979-07-01), Giffin et al.
patent: 4197000 (1980-04-01), Blackwood
patent: 4286541 (1981-09-01), Blackwood

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